Inorganic graded barrier film and methods for their manufacture
US10745795B2 · kind B2 · utility
2Cited by
9References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 28, 2009 |
| Grant date | Aug 18, 2020 |
| Priority date | — |
| Expiry date | Oct 11, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31971
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention refers to a graded barrier film comprising a layered structure, wherein the layered structure comprises a first layer consisting of metal oxide; an intermediate layer consisting of metal nitride or metal oxynitride which is arranged on the first layer; and a third layer consisting of a metal oxide which is arranged on the intermediate layer. The present invention further refers to a sputtering method for manufacturing this graded barrier film and a device encapsulated with this graded barrier film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.