Multi-mask alignment system and method
US10745796B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 1, 2019 |
| Grant date | Aug 18, 2020 |
| Priority date | — |
| Expiry date | Apr 1, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/682
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In a multi-mask alignment system and method, a carrier frame is provided having a number of apertures therethrough. A number of shadow mask-frame combinations are also provided. Each shadow mask-frame combination includes a first set of alignment features and each shadow mask-frame combination is positioned on a first side of the carrier with the frame supporting the shadow mask in alignment with one of the apertures. A single alignment stage is provided and a control system including a programmed controller is also provided. Under the control of the controller, the single alignment stage translates to each shadow mask-frame combination, one-at-a time, and adjusts the position of the shadow mask-frame combination based on positions of the first set of alignment features determined by the controller.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.