Method and system for tunable gradient patterning using a shadow mask
US10747012B2 · kind B2 · utility
1Cited by
5References
20Claims
0Family size
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Key dates
| Filing date | Dec 5, 2019 |
| Grant date | Aug 18, 2020 |
| Priority date | — |
| Expiry date | Dec 5, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2027/0174
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of depositing a variable thickness material includes providing a substrate and providing a shadow mask having a first region with a first aperture dimension to aperture periodicity ratio and a second region with a second aperture dimension to aperture periodicity ratio less than the first aperture dimension to aperture periodicity ratio. The method also includes positioning the shadow mask adjacent the substrate and performing a plasma deposition process on the substrate to deposit the variable thickness material. A layer thickness adjacent the first region is greater than a layer thickness adjacent the second region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.