Multi-cathode EUV and soft x-ray source
US10748734B2 · kind B2 · utility
1Cited by
17References
16Claims
0Family size
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Key dates
| Filing date | Sep 5, 2016 |
| Grant date | Aug 18, 2020 |
| Priority date | — |
| Expiry date | Aug 17, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2235/086
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An efficient source of EUV or SXR flux uses multiple e-beams from multiple cathodes to impact a wide anode target with a flux-generating surface to generate flux over a wide area. The conversion efficiency of e-beam power to flux power may be improved by the direction of the e-beams towards the anode target at shallow or grazing incidence angles or the use of mirrored anode surfaces which reflect EUV or SXR. The source is enclosed in a vacuum chamber and performs work such as the penetration of photoresist on a semiconductor wafer in vacuum.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.