Array substrate comprising transistor and capacitor, manufacturing method therefor, display device
US10748944B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | May 9, 2018 |
| Grant date | Aug 18, 2020 |
| Priority date | — |
| Expiry date | May 9, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/324
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for manufacturing an array substrate, including: forming a semiconductor material film on a substrate, the method further including: forming a metal film covering the semiconductor material film; and performing a single patterning process on the metal film and the semiconductor material film to form an active layer, a semiconductor material remained pattern and a first electrode of a storage capacitor. The semiconductor material remained pattern is in a same layer as the active layer; and the first electrode of the storage capacitor is formed of the metal film and is on a side, away from the substrate, of the semiconductor material remained pattern. An array substrate and a display device are also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.