Patent · US Active

Cleaning compositions

US10752867B2 · kind B2 · utility

3Cited by

1References

24Claims

0Family size

Assignee

Fujifilm Electronic Materials U.S.A., Inc. · US

Inventors

Thomas Dory · Gilbert, US
Mick Bjelopavlic · Chandler, US
Joshua Guske · Mesa, US
Kazutaka Takahashi · Shizuoka, JP

Key dates

Filing date	Feb 19, 2019
Grant date	Aug 25, 2020
Priority date	—
Expiry date	Feb 19, 2039

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC11D2111/22
WIPO fieldBasic materials chemistry
WIPO sectorChemistry

Abstract

This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one alkylsulfonic acid or a salt thereof, the alkylsulfonic acid containing an alkyl group substituted by OH or NH2; 3) at least one aminoalcohol; 4) at least one corrosion inhibitor; 5) at least one water soluble organic solvent; 6) water; and 7) optionally, at least one pH adjusting agent.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.