System and method for enhancing a diffusion limited CVI/CVD process
US10752988B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 18, 2018 |
| Grant date | Aug 25, 2020 |
| Priority date | — |
| Expiry date | Mar 21, 2039 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC04B2235/614
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A system and method for enhancing a diffusion limited CVI/CVD process is provided. The system may densify a porous structure by flowing a reactant gas around the porous structure. A mass flow controller may be configured to pulse the flow rate of the reactant gas around the porous structure. The mass flow controller may pulse the flow rate from a nominal flow rate to a first flow rate. The mass flow controller may pulse the first flow rate back to the nominal flow rate or to a second flow rate. The mass flow controller may pulse the flow rate between the nominal flow rate, the first flow rate, and the second flow rate, as desired.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.