Patent · US Active

Electrolytic chlorine dioxide gas manufacturing device

US10753004B2 · kind B2 · utility

0Cited by
1References
8Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 31, 2015
Grant dateAug 25, 2020
Priority date
Expiry dateOct 25, 2036

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01B11/022
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

The present invention provides a chlorine dioxide manufacturing device that can accurately control the amount of chlorine dioxide produced. The present invention provides a chlorine dioxide gas manufacturing device comprising an electrolysis chamber, a liquid surface level measuring chamber, and a bubbling gas feeding device. The electrolysis chamber and the liquid surface level measuring chamber each comprises an electrolytic solution and a gas and the electrolysis chamber and the liquid surface level measuring chamber are joined to each other above each liquid surface via a gas piping and joined to each other below each liquid surface via an electrolytic solution piping so that the height of the electrolytic solutions contained in each chamber are substantially equal.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.