Textured self-cleaning film system and method of forming same
US10754067B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 18, 2017 |
| Grant date | Aug 25, 2020 |
| Priority date | — |
| Expiry date | Dec 1, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B1/18
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A self-cleaning film system includes a substrate and an anti-reflection film disposed on the substrate. The anti-reflection film includes a first sheet formed from titanium dioxide, a second sheet formed from silicon dioxide and disposed on the first sheet, and a third sheet formed from titanium dioxide and disposed on the second sheet. The system includes a self-cleaning film disposed on the anti-reflection film and including a monolayer disposed on the third sheet and formed from a fluorinated material selected from the group consisting of fluorinated organic compounds, fluorinated inorganic compounds, and combinations thereof. The self-cleaning film includes a first plurality of regions disposed within the monolayer such that each of the first plurality of regions abuts and is surrounded by the fluorinated material and includes a photocatalytic material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.