Manufacturing method for metal grating, metal grating and display device
US10754247B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Mar 30, 2018 |
| Grant date | Aug 25, 2020 |
| Priority date | — |
| Expiry date | Sep 21, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2201/30
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present disclosure proposes a manufacturing method for a metal grating, a metal grating, and a display device. The manufacturing method comprises: forming a metal layer, an antireflective layer and a deep UV photoresist layer sequentially on a base substrate; etching the deep UV photoresist layer by a photolithography process, so as to form a grating mask pattern; etching the antireflective layer by a dry etching process with the help of the grating mask pattern, so as to form an etch mask pattern identical to the grating mask pattern; peeling off the grating mask pattern; etching the metal layer by a dry etching process with the help of the etch mask pattern, so as to form metal grating strips; and removing the etch mask pattern, thus forming a metal grating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.