Patent · US Active

Method for producing C2-C20 fluorine-containing organic acid, and composition comprising C2-C20 fluorine-containing organic acid

US10759731B2 · kind B2 · utility

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20Claims
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Key dates

Filing dateJun 9, 2017
Grant dateSep 1, 2020
Priority date
Expiry dateJun 9, 2037

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC07C309/06
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

There is provided a method for producing a C2-C20 fluorine-containing organic acid with reduced fluorine-free organic compound. A method for producing a C2-C20 fluorine-containing organic acid, the method including contacting a mixture containing a C2-C20 fluorine-containing organic acid and a fluorine-free organic compound with a concentrated sulfuric acid and then separating a C2-C20 fluorine-containing organic acid phase from a concentrated sulfuric acid phase. The contacting is conducted such that an amount of water present in the concentrated sulfuric acid phase is 10% by mass or less, and the C2-C20 fluorine-containing organic acid is obtained in the form of the C2-C20 fluorinated organic acid phase having a reduced content ratio of the fluorine-free organic compound compared with said mixture.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.