Thin film diamond coating system and method
US10760157B2 · kind B2 · utility
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5References
10Claims
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Key dates
| Filing date | Aug 9, 2017 |
| Grant date | Sep 1, 2020 |
| Priority date | — |
| Expiry date | Dec 3, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/153
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Disclosed herein is a transparent glass system that includes an optical grade silicon substrate, and a nanocrystalline diamond film on the silicon substrate, the diamond film deposited using a chemical vapor deposition system having a reactor in which methane, hydrogen and argon source gases are added. Further disclosed is a method of fabricating transparent glass that includes the steps of seeding an optical grade silicon substrate and forming a nanocrystalline diamond film on the silicon substrate using a chemical vapor deposition system having a reactor in which methane, hydrogen and argon source gases are added.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.