Patent · US Active

Electroless copper plating polydopamine nanoparticles

US10760162B2 · kind B2 · utility

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20Claims
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Assignee

Inventors

Key dates

Filing dateMay 16, 2019
Grant dateSep 1, 2020
Priority date
Expiry dateMay 16, 2039

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K2203/1173
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Aqueous dispersions of artificially synthesized, mussel-inspired polydopamine nanoparticles were inkjet printed on flexible polyethylene terephthalate (PET) substrates. Narrow line patterns (4 μm in width) of polydopamine resulted due to evaporatively driven transport (coffee ring effect). The printed patterns were metallized via a site-selective Cu electroless plating process at a controlled temperature (30° C.) for varied bath times. The lowest electrical resistivity value of the plated Cu lines was about 6 times greater than the bulk resistivity of Cu. This process presents an industrially viable way to fabricate Cu conductive fine patterns for flexible electronics at low temperature, and low cost.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.