Laser exposure head with reduced leakage
US10761399B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 26, 2018 |
| Grant date | Sep 1, 2020 |
| Priority date | — |
| Expiry date | Mar 1, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2201/305
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A laser exposure system includes an electrically-controlled diffraction grating which can be controlled to be in a first state where the incident light beam is undiffracted and a second state where the incident light beam is diffracted into a plurality of light beams including a zero-order light beam and first and second diffracted light beams. An aperture structure which passes the first and second diffracted light beams while blocking the zero-order light beam. A polarization rotator rotates a polarization state of the second diffracted light, and a polarization beam combiner combines the first diffracted light beam and the polarization-rotated second diffracted light beam onto a common path forming a combined light beam. An optical element focuses the combined light beam onto an imaging medium. A controller controls the state of the electrically-controlled diffraction grating in accordance with pixel data to form a printed image.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.