Liquid precursor compositions, preparation methods thereof, and methods for forming layer using the composition
US10763001B2 · kind B2 · utility
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10Claims
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Key dates
| Filing date | Jun 7, 2018 |
| Grant date | Sep 1, 2020 |
| Priority date | — |
| Expiry date | Jul 4, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/28556
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Liquid precursor compositions are provided, along with methods of preparing the liquid precursor compositions, and methods for forming layers using the liquid precursor composition, for example in vapor deposition processes such as CVD and ALD. In some embodiments, the liquid precursor compositions comprise a metal compound of the formula M(DAD)2, where M is Co or Ni and DAD is a diazadiene ligand.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.