Imprint apparatus and article manufacturing method
US10768525B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 2, 2017 |
| Grant date | Sep 8, 2020 |
| Priority date | — |
| Expiry date | Jun 9, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0002
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An imprint apparatus forms a pattern by curing a radical polymerizable imprint material by irradiating the imprint material with light in a state in which a mold is brought into contact with the imprint material. The apparatus includes an irradiator configured to irradiate the imprint material with light, and a controller configured to control the irradiator. Letting Ic be an illuminance of the light with which the imprint material is irradiated, tc be a time during which the imprint material is irradiated with the light, k be a coefficient, and PD be a target degree of photopolymerization of the imprint material subjected to irradiation with the light, the controller determines the irradiation time in accordance with: PD=k×(√Ic)×tc.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.