Systems and methods for generating planar geometry
US10769847B2 · kind B2 · utility
3Cited by
16References
20Claims
0Family size
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Key dates
| Filing date | Mar 27, 2020 |
| Grant date | Sep 8, 2020 |
| Priority date | — |
| Expiry date | Mar 27, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2219/2008
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Systems and methods are described for adjusting planar geometry derived from point cloud data associated with a building object by identifying major aspects like vertices and edges of the underlying structure within the point cloud and adjusting an average planar fit for simplified geometries created from the point cloud. Combining the planar geometry or point cloud with orthogonal or street level views improves accuracy and use cases of the planar geometry.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.