Antimicrobial fabric application system
US10774460B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 10, 2018 |
| Grant date | Sep 15, 2020 |
| Priority date | — |
| Expiry date | Dec 11, 2038 |
Classification
- Technology area (CPC D)Textiles; Paper
- CPC primaryD06F2105/58
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An antimicrobial supply system employs a process water supply and incorporates a metallic ion supply connected to the process water supply to provide a high ion concentrate to an output. A dilution reservoir is connected to the metallic ion supply output and has an input from the process water supply. A pump is connected to an output of the reservoir. A manifold connected to the pump provides a dilute concentrate to at least one washing system. An electronics control module is connected to a first flow controller between the process water supply and the metallic ion supply and a second flow controller between the metallic ion supply and the reservoir for dilution control establishing a desired metallic ion concentration.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.