MEMS projector using multiple laser sources
US10778940B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 4, 2019 |
| Grant date | Sep 15, 2020 |
| Priority date | — |
| Expiry date | Feb 4, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG09G2310/0224
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A projector includes a first laser source projecting a first laser beam, a second laser source projecting a second laser beam at an angle with respect to the first laser beam, and a mirror reflecting the first and second laser beams. Circuitry controls the mirror to simultaneously reflect the first and second laser beams in a first scan pattern to form a first image having a number of scan lines greater than two times a horizontal resonance frequency of the mirror divided by a desired frame rate of the first image. The first laser beam forms a first angle of incidence with the mirror and the second laser beam forms a second angle of incidence with the mirror, the second angle of incidence being equal to the first angle of incidence summed with the angle of the second laser beam with respect to the first laser beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.