Patent · US Active

Method for automatable or automated determination of the focal position of a laser beam generated by an exposure device

US10780522B2 · kind B2 · utility

0Cited by

1References

20Claims

0Family size

Assignee

Concept Laser, GmbH · DE

Inventors

Florian Bechmann · Lichtenfels, DE
Markus Stark · Herrieden, DE
Fabian Zeulner · Lichtenfels, DE

Key dates

Filing date	Nov 10, 2017
Grant date	Sep 22, 2020
Priority date	—
Expiry date	Aug 14, 2038

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02P10/25
WIPO fieldOther special machines
WIPO sectorMechanical engineering

Abstract

A method for automatable or automated determination of the focal position of a laser beam (2) including the following steps: —arranging a substrate (10) in a first exposure position (z1), and exposing the substrate (10) with at least one exposure vector (13) in the first exposure position (z1), —moving the substrate (10) into several other exposure positions, in which the substrate (10) is respectively arranged in another certain z-axis position (zn) relative to the reference point (11), and respectively exposing the substrate (10) with at least one exposure vector (13) in the respective other exposure positions (zn), —optically evaluating the exposure pattern (12) by detecting different contrast sections in the exposure pattern (12) that can be optically detected, —determining the focal position of the laser beam (2) based on the detected optical contrast sections.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.