Device for mask projection of femtosecond and picosecond laser beams with blade, mask, and lens system

US10780525B2 · kind B2 · utility

Assignee

• BOEGLI-GRAVURES SA · CH

Inventors

• Günter Reisse · Chemnitz, DE
• Steffen Weissmantel · Chemnitz, DE
• Andy Engel · Portola Valley, US
• Manuel Pfeiffer · Geringswalde, DE
• Alexander Kratsch · Geringswalde, DE
• Charles Boegli · Marin-Epagnier, CH
• Matthias Kahl · Marin-Epagnier, CH

Key dates

• Filing date: May 12, 2015
• Grant date: Sep 22, 2020
• Expiry date: Apr 7, 2036

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B23K26/16
• WIPO field: Machine tools
• WIPO sector: Mechanical engineering

Abstract

The present application relates to a device for the mask projection of femtosecond or picosecond laser beams (2) onto a substrate surface, in which the laser beam (2) consisting of laser beam pulses is, at a location of the optical axis, formed to make laser beam pulses with an expanded laser beam cross section or laser beam pulses with a reduced laser beam cross section and said laser beam (2) has a homogeneous intensity distribution over the laser beam cross section. A stop (6) with a predetermined stop aperture geometry and a mask (7) with a predetermined mask aperture geometry are positioned in succession in the beam (2) path at the location. The device contains a field lens system (8) and an imaging lens (10), which are positioned in such a way that the non-diffracted and diffracted beam components of the laser beam (2) pulses transmitted by the stop (6) and the mask (7) are directed into the imaging lens (10) with a predetermined aperture with the aid of the field lens system (8) in such a way that a reduced image, ac curate in every detail and having a predetermined imaging ratio, of the intensity profile generated by the stop (6) and the mask (7) is generated over the laser…