Patent · US Active

Coating source for producing doped carbon layers

US10781102B2 · kind B2 · utility

0Cited by

4References

6Claims

0Family size

Assignee

PLANSEE COMPOSITE MATERIALS GMBH · DE

Inventors

Peter Polcik · Reutte, AT
SABINE WOERLE · Pflach, AT
Ulrich Miller · Tapfheim, DE

Key dates

Filing date	Mar 15, 2016
Grant date	Sep 22, 2020
Priority date	—
Expiry date	Aug 2, 2036

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC01P2004/61
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

A coating source for physical vapor deposition to produce doped carbon layers. The coating source is produced by way of sintering from pulverulent components and is formed of carbon as matrix material in a proportion of at least 75 mol % and at least one dopant in a proportion in the range from 1 mol % to 25 mol %.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.