Process for preventing the deposition of polymers in a process for purifying (meth)acrylic acid
US10781157B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 6, 2017 |
| Grant date | Sep 22, 2020 |
| Priority date | — |
| Expiry date | Dec 6, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C57/04
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
This invention produces technical (meth)acrylic acid without being confronted with problems of fouling of systems to purify the crude reaction mixture of (meth)acrylic acid synthesis, due to the presence of glyoxal formed during synthesis. The invention is based on the addition or generation of quinoline derivative in a glyoxal-containing (meth)acrylic acid flow in a quinoline/glyoxal derivative molar ratio ranging from 0.1 to 5, during the purification steps, said quinoline compound with one of formulas (I) or (II): wherein, groups R1, R2, R3, and R4 independently denote a hydrogen atom or a C1-C6, or R1 et R2 C-alkyl group combine and together with the atoms to which they are attached, form a saturated or unsaturated ring or heterocycle, preferably a phenyl group, and/or R3 and R4 combine and with the atoms to which they are attached, form a saturated or unsaturated ring or heterocycle, preferably a phenyl group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.