Patent · US Active

Reflector element and a method for manufacturing same

US10782456B2 · kind B2 · utility

3Cited by

9References

20Claims

0Family size

Assignee

Siteco GmbH · DE

Inventors

Mark Schürmann · Jena, DE
Peter Munzert · Jena, DE
Dirk Salz · Bremen, DE
Klaus Stockwald · Munich, DE
Reinhard Schaefer · Freiamt, DE
Stefan Kotter · Augsburg, DE
Paul Braun · Troisdorf, DE

Key dates

Filing date	Feb 26, 2016
Grant date	Sep 22, 2020
Priority date	—
Expiry date	Feb 26, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG02B1/14
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A reflector element and a method for manufacturing a reflector element are disclosed. In an embodiment the reflector element includes a plastic substrate and a silver layer arranged on the plastic substrate. The reflector element further includes a first barrier layer arranged on the silver layer, wherein the barrier layer has an at least 15 nm-thick oxide layer and a second barrier layer arranged on the first barrier layer, wherein the barrier layer includes siloxane, and wherein a thickness of the second barrier layer is at least 250 nm and at most 450 nm.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.