Stereoscopic reflection pattern, backlight unit, display device
US10782563B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 19, 2019 |
| Grant date | Sep 22, 2020 |
| Priority date | — |
| Expiry date | Aug 19, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133614
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A stereoscopic reflection pattern includes a first reflection pattern including a first portion facing the light source and having a first reflectivity with respect to the light having the first wavelength band, and a second portion disposed adjacent to the first portion and having a second reflectivity with respect to the light having the first wavelength band, and the a second reflectivity being lower than the first reflectivity, and a second reflection pattern disposed between the plurality of light sources and the first reflection pattern, at least partially corresponding to the second portion of the first reflection pattern and having a third reflectivity with respect to the light in the first wavelength band which is higher than the second reflectivity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.