Methods for producing integrated circuits with magnets and a wet etchant for the same
US10784332B2 · kind B2 · utility
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18Claims
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Assignee
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Key dates
| Filing date | Mar 22, 2018 |
| Grant date | Sep 22, 2020 |
| Priority date | — |
| Expiry date | Jun 21, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2201/086
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Integrated circuits and methods of producing the same are provided. In an exemplary embodiment, a method of producing an integrated circuit includes forming a lower conductor element overlying a substrate, and forming a magnetic stack layer overlying the lower conductor element. A waste portion of the magnetic stack layer is removed with a wet etchant to produce a magnetic core. The wet etchant includes hydrofluoric acid, a second acid different than the hydrofluoric acid, an oxidizer, and a solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.