Masking and de-masking systems and processes
US10786981B2 · kind B2 · utility
Inventors
Key dates
| Filing date | Jul 7, 2017 |
| Grant date | Sep 29, 2020 |
| Priority date | — |
| Expiry date | Jul 7, 2037 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB32B2457/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An automated masking system includes a substrate loading apparatus designed to hold a plurality of substrates, a first masking material application station designed to automatically apply a first masking material to a portion of the substrate, and a second masking material application station designed to automatically apply a second masking material to a portion of the substrate, the second masking material being different than the first masking material. The system includes a first dispensing apparatus and a second dispensing apparatus that move relative to the substrate in a repeatable motion. The substrate moves automatically from the first masking material application station to the second masking material application station.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.