Process for the generation of thin inorganic films

US10787738B2 · kind B2 · utility

Assignee

• BASF SE

Inventors

• Falko Abels · Ludwigshafen, DE
• Daniel LOEFFLER · Ludwigshafen, DE
• Hagen Wilmer · Ludwigshafen, DE
• Robert M. Wolf · Freeburg, US
• Christian Roedl · Regensburg, DE
• Philipp Bueschelberger · Regensburg, DE

Key dates

• Filing date: Jan 17, 2017
• Grant date: Sep 29, 2020
• Expiry date: Apr 2, 2037

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C01P2002/88
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. In particular, a process of bringing a compound of general formula (I) into the gaseous or aerosol state Ln - - - M - - - Xm  (I) and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein M is a metal, L is a ligand which coordinates to M and contains at least one phosphorus-carbon multiple bond, wherein L contains a phosphorus-containing heterocyclic ring or a phosphorus-carbon triple bond, X is a ligand which coordinates to M, n is 1 to 5, and m is 0 to 5.