Semi-supervised anomaly detection in scanning electron microscope images
US10789703B2 · kind B2 · utility
4Cited by
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Key dates
| Filing date | Aug 21, 2018 |
| Grant date | Sep 29, 2020 |
| Priority date | — |
| Expiry date | Feb 21, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Autoencoder-based, semi-supervised approaches are used for anomaly detection. Defects on semiconductor wafers can be discovered using these approaches. The model can include a variational autoencoder, such as a one that includes ladder networks. Defect-free or clean images can be used to train the model that is later used to discover defects or other anomalies.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.