Activated gas generation apparatus and film-formation treatment apparatus
US10793953B2 · kind B2 · utility
3Cited by
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15Claims
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Assignee
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Key dates
| Filing date | Jan 18, 2016 |
| Grant date | Oct 6, 2020 |
| Priority date | — |
| Expiry date | Jul 25, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2245/40
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In an activated gas generation apparatus, metal electrodes are formed on a bottom surface of a dielectric electrode, and are disposed so as to face each other with a central region of the dielectric electrode interposed therebetween in plan view. The metal electrodes face each other along the Y direction. A wedge-shaped stepped part is provided so as to protrude upward in the central region on an upper surface of the dielectric electrode. The wedge-shaped stepped part is formed so as to have a shorter formation width in the Y direction as approaching each of a plurality of gas spray holes in plan view.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.