Planar processing of suspended microelectromechanical systems (MEMS) devices
US10800649B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 28, 2016 |
| Grant date | Oct 13, 2020 |
| Priority date | — |
| Expiry date | Nov 28, 2036 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81B2203/0315
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Suspended microelectromechanical systems (MEMS) devices including a stack of one or more materials over a cavity in a substrate are described. The suspended MEMS device may be formed by forming the stack, which may include one or more electrode layers and an active layer, over the substrate and removing part of the substrate underneath the stack to form the cavity. The resulting suspended MEMS device may include one or more channels that extend from a surface of the device to the cavity and the one or more channels have sidewalls with a spacer material. The cavity may have rounded corners and may extend beyond the one or more channels to form one or more undercut regions. The manner of fabrication may allow for forming the stack layers with a high degree of planarity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.