Patent · US Active

Process for the generation of thin inorganic films

US10801105B2 · kind B2 · utility

0Cited by

1References

14Claims

0Family size

Assignee

BASF SE

Inventors

Torben Adermann · Ludwigshafen, DE
Daniel LOEFFLER · Ludwigshafen, DE
Carolin Limburg · Ludwigshafen, DE
Falko Abels · Ludwigshafen, DE
Hagen Wilmer · Ludwigshafen, DE
Monica Gill · Charlottetown, CA
Matthew Bertram Edward GRIFFITHS · Ottawa, CA
Sean T. Barry · Ottawa, CA

Key dates

Filing date	Nov 18, 2016
Grant date	Oct 13, 2020
Priority date	—
Expiry date	Mar 30, 2037

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C16/45553
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. The present invention relates to a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R1, R2, R3, and R4 are independent of each other an alkyl group, an aryl group or a trialkylsilyl group, M is Mn, Ni or Co, X is a ligand which coordinates M, wherein at least one X is a neutrally charged ligand, m is 1, 2 or 3 and n is at least 1 wherein the molecular weight of the compound of general formula (I) is up to 1000 g/mol.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.