Method of irradiating electromagnetic pulse and electromagnetic pulse irradiating system
US10801817B2 · kind B2 · utility
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7Claims
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Key dates
| Filing date | Apr 14, 2016 |
| Grant date | Oct 13, 2020 |
| Priority date | — |
| Expiry date | Jul 11, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/24
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A method of irradiating an electromagnetic pulse includes specifying a position of a target having electronic equipment; setting the light-condensing point based on the position of the target; and condensing the laser beam to generate plasma in the light-condensing point such that the electromagnetic pulse generated from the plasma is irradiated to the electronic equipment. In this way, a method and system for irradiating an electromagnetic pulse are realized which can irradiate the electromagnetic pulse of a large output while restraining diffusion of the electromagnetic pulse.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.