Patent · US Active

Thin film total internal reflection diffraction grating for single polarization or dual polarization

US10802183B2 · kind B2 · utility

0Cited by

124References

20Claims

0Family size

Assignee

Lumentum Operations LLC · US

Inventors

John Michael Miller · Saline, US
Gonzalo Wills · Ottawa, CA
Lu Tian · Plano, US
Michael O'Leary · San Jose, US

Key dates

Filing date	Feb 28, 2019
Grant date	Oct 13, 2020
Priority date	—
Expiry date	Feb 28, 2039

Classification

Technology area (CPC G)Physics
CPC primaryG02B27/4261
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A diffraction grating may include a substrate. The diffraction grating may include an etch stop layer to prevent etching of the substrate. The etch stop layer may be deposited on the substrate. The diffraction grating may include a marker layer to indicate an etch end-point associated with etching of a dielectric layer. The marker layer may be deposited on a portion of the etch stop layer. The diffraction grating may include the dielectric layer to form a grating layer after being etched. The dielectric layer may be deposited on at least the marker layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.