Microlithographic fabrication of structures

US10802397B2 · kind B2 · utility

Assignee

• Molecular Imprints, Inc. · US

Inventors

• Vikramjit Singh · Pflugerville, US
• Kang Luo · Austin, US
• Michael Nevin Miller · Austin, US
• Shuqiang Yang · Austin, US
• Frank Y. Xu · Round Rock, US

Key dates

• Filing date: Mar 6, 2020
• Grant date: Oct 13, 2020
• Expiry date: Mar 6, 2040

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/7035
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Micro- and nano-patterns in imprint layers formed on a substrate and lithographic methods for forming such layers. The layers include a plurality of structures, and a residual layer having a residual layer thickness (RLT) that extends from the surface of the substrate to a base of the structures, where the RLT varies across the surface of the substrate according to a predefined pattern.