Cathode assembly, physical vapor deposition system, and method for physical vapor deposition
US10804083B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Jul 9, 2014 |
| Grant date | Oct 13, 2020 |
| Priority date | — |
| Expiry date | Oct 7, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3497
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A cathode assembly for a physical vapor deposition (PVD) system includes a target holder and a thickness detector. The target holder is for holding a target, in which the target has a first major surface and a second major surface. The first major surface and the second major surface are respectively proximal and distal to the target holder. The thickness detector is disposed on the target holder. At least one portion of the first major surface is exposed to the thickness detector for allowing the thickness detector to detect the thickness of the target through the first major surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.