Patent · US Active

Method for synthesising a material

US10808320B2 · kind B2 · utility

0Cited by

1References

22Claims

0Family size

Assignee

DIAROTECH S.A. · BE

Inventors

Horacio Tellez Oliva · Charleroi, BE
Alain Roch · Mons, BE
Etienne Lamine · Court-Saint-Etienne, BE

Key dates

Filing date	Jan 16, 2017
Grant date	Oct 20, 2020
Priority date	—
Expiry date	Jul 18, 2037

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC30B29/22
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

The method involves a substrate 21 near which reagents 25 are provided. Pump (26) and Raman (27) photons make it possible to create a stimulated Raman emission during the synthesis (29) of the material. The Raman emission can be Stokes or anti-Stokes. In one embodiment of the invention, the zone where the synthesis (29) occurs is in an optical cavity and Raman photons (27) emitted by the Raman emission are reoriented toward the zone where the synthesis (29) occurs. In another embodiment of the invention, the zone where the synthesis (29) occurs is not in an optical cavity, and a stream of Raman photons (27) is created in an outside optical cavity before being sent toward the zone where the synthesis (29) occurs. The synthesis (29) preferably involves a CVD method or solidification by the Czochralski method.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.