Patent · US Active

Cylindrical evaporation source

US10811239B2 · kind B2 · utility

1Cited by

5References

21Claims

0Family size

Assignee

Oerlikon Surface Solutions AG, Pfäffikon · CH

Inventors

Joerg Vetter · Bensberg, DE
Stefan Esser · Aachen, DE
Jurgen Mueller · Olpe, DE
Georg Erkens · Aachen, DE

Key dates

Filing date	Feb 24, 2014
Grant date	Oct 20, 2020
Priority date	—
Expiry date	Mar 9, 2035

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/345
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Cylindrical evaporation source which includes, at an outer cylinder wall, target material to be evaporated as well as a first magnetic field source and a second magnetic field source which form at least a part of a magnet system and are arranged in an interior of the cylindrical evaporation source for generating a magnetic field. In this respect, first magnetic field source and second magnetic field source are provided at a carrier system such that a shape and/or a strength of the magnetic field can be set in a predefinable spatial region in accordance with a predefinable scheme. In embodiments, the carrier system is configured for setting the shape and/or strength of the magnetic field of the carrier system such that the first magnetic field source is arranged at a first carrier arm and is pivotable by a predefinable pivot angle (α1) with respect to a first pivot axis.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.