Ion injecting device using vacant baffle and faraday cups, and ion injecting method thereof, for detecting content of suspending particles
US10811259B2 · kind B2 · utility
0Cited by
3References
10Claims
0Family size
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Key dates
| Filing date | Aug 10, 2018 |
| Grant date | Oct 20, 2020 |
| Priority date | — |
| Expiry date | Aug 10, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31705
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The disclosure discloses an ion injecting device, and an ion injecting method thereof, where the ion injecting device is modified by adding a vacant baffle between a process chamber and an analyzing magnet. Moreover the vacant baffle is closed before an engineer opens the process chamber for cleaning, so that the process chamber is separated from the analyzing magnet, thus maintaining a vacuum environment in the analyzing magnet. Subsequently only a vacuum environment in the process chamber will be created again.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.