Fabricating photonics structure light signal transmission regions

US10816724B2 · kind B2 · utility

Assignee

• The Research Foundation for The State University of New York · US

Inventors

• Douglas D. Coolbaugh · Highland, US
• Gerald L. Leake · Albany, US

Key dates

• Filing date: Apr 2, 2019
• Grant date: Oct 27, 2020
• Expiry date: Apr 2, 2039

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/4857
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

There is set forth herein a method including depositing a layer formed of barrier material over a conductive material formation of a photonics structure; and removing material of the layer in a light signal transmitting region of the photonics structure. In one embodiment the barrier material can include silicon carbon nitride. In one embodiment the barrier material can include silicon nitride.