Patent · US Active

Silicon-based hardmask

US10818493B2 · kind B2 · utility

0Cited by

3References

11Claims

0Family size

Assignee

Rohm and Haas Electronic Materials LLC · US

Inventors

Suzanne M. Coley · Mansfield, US
Paul J. LaBeaume · Auburn, US
Shintaro Yamada · Shrewsbury, US
Cecilia W. Kiarie · Marlborough, US
Li Cui · Westborough, US
Bhooshan Popere · Berkeley, US

Key dates

Filing date	Dec 13, 2018
Grant date	Oct 27, 2020
Priority date	—
Expiry date	Dec 13, 2038

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC08G77/80
WIPO fieldMacromolecular chemistry, polymers
WIPO sectorChemistry

Abstract

Compositions for forming thin, silicon-containing antireflective coatings and methods of using these compositions in the manufacture of electronic devices are provided. Silicon-containing antireflective coatings formed from the these compositions can be easily removed during processing without the need for a separate removal step.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.