Ultrafast laser fabrication method and system
US10821671B2 · kind B2 · utility
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16Claims
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Key dates
| Filing date | Mar 1, 2019 |
| Grant date | Nov 3, 2020 |
| Priority date | — |
| Expiry date | Mar 1, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03H2225/24
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A laser fabrication method and a laser fabrication system. The laser fabrication system includes an ultrafast laser source configured to output a laser beam; and a digital micromirror device (DMD), configured to receive, shape, and scan the laser beam, wherein more than one binary holograms are synthesized to form a scanning hologram applied to the DMD. The shaped laser beam, containing one or multiple focal points, leaving the DMD, are focused to the sample for fast laser fabrication.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.