Measurement device and measurement method for thin film provided with transparent substrate
US10823663B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 20, 2016 |
| Grant date | Nov 3, 2020 |
| Priority date | — |
| Expiry date | Dec 31, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/068
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A measurement device for measuring a thin film on a transparent substrate is disclosed which includes, disposed sequentially along the direction of light propagation, a light source (1), a collimator lens (2), a filter (3), a polarizer (4), a beam splitter (5) and an objective lens (7). To the beam splitter (5) are connected a planar array detector (11) and a processor (13). Light emitted by the light source (1) sequentially passes through the collimator lens (2), the filter (3), the polarizer (4), the beam splitter (5) and the objective lens (7) and thereby forms a measuring light incident on the thin film. The objective lens (7) and the beam splitter (5) gather light reflected from the thin film, and the planar array detector (11) and the processor (13) measure physical parameters of the thin film based on the gathered reflected light. The device further includes a stop configured to block interfering light reflected from the transparent substrate during the measurement.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.