Patent · US Active

Nanograting method and apparatus

US10823894B2 · kind B2 · utility

18Cited by
26References
6Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 8, 2019
Grant dateNov 3, 2020
Priority date
Expiry dateOct 8, 2039

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH04N9/3144
  • WIPO fieldAudio-visual technology
  • WIPO sectorElectrical engineering

Abstract

A method of manufacturing a waveguide having a combination of a binary grating structure and a blazed grating structure includes cutting a substrate off-axis, depositing a first layer on the substrate, and depositing a resist layer on the first layer. The resist layer includes a pattern. The method also includes etching the first layer in the pattern using the resist layer as a mask. The pattern includes a first region and a second region. The method further includes creating the binary grating structure in the substrate in the second region and creating the blazed grating structure in the substrate in the first region.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.