Method for generative production of relief printing plates by monomer diffusion through an integral mask layer
US10824072B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 19, 2016 |
| Grant date | Nov 3, 2020 |
| Priority date | — |
| Expiry date | Oct 29, 2037 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29C2035/0838
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention relates to a method for generative production of relief printing plates, wherein a support with a polymeric substrate layer and a laser-ablatable mask layer is provided, the polymeric substrate layer containing a first binder. A mask with openings corresponding to pixels is produced by imagewise laser ablation of the mask layer. A liquid containing a reactive monomer is then applied over the surface of the mask-covered polymeric substrate layer, and the liquid or the reactive monomer diffuses through the openings of the mask into the polymeric substrate layer for a defined exposure time so as to form a relief. The excess liquid or the excess monomer and optionally the mask are removed from the surface, and the resulting relief is fixed by crosslinking.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.