Patent · US Active

Method for generative production of relief printing plates by monomer diffusion through an integral mask layer

US10824072B2 · kind B2 · utility

0Cited by
5References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 19, 2016
Grant dateNov 3, 2020
Priority date
Expiry dateOct 29, 2037

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB29C2035/0838
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

The invention relates to a method for generative production of relief printing plates, wherein a support with a polymeric substrate layer and a laser-ablatable mask layer is provided, the polymeric substrate layer containing a first binder. A mask with openings corresponding to pixels is produced by imagewise laser ablation of the mask layer. A liquid containing a reactive monomer is then applied over the surface of the mask-covered polymeric substrate layer, and the liquid or the reactive monomer diffuses through the openings of the mask into the polymeric substrate layer for a defined exposure time so as to form a relief. The excess liquid or the excess monomer and optionally the mask are removed from the surface, and the resulting relief is fixed by crosslinking.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.