Patent · US Active

Atomic layer deposition of lead sulfide for infrared optoelectronic devices

US10826005B2 · kind B2 · utility

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14Claims
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Key dates

Filing dateSep 24, 2015
Grant dateNov 3, 2020
Priority date
Expiry dateSep 24, 2035

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E10/549

Abstract

A PIN type infrared photodiode including a first electrode, a n-type semiconductor, an atomic layer deposition coating of lead sulfide, a p-type semiconductor and a second electrode, wherein the n-type semiconductor comprises nanowires conformally coated with the atomic layer deposition coating of lead sulfide.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.