Atomic layer deposition of lead sulfide for infrared optoelectronic devices
US10826005B2 · kind B2 · utility
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Key dates
| Filing date | Sep 24, 2015 |
| Grant date | Nov 3, 2020 |
| Priority date | — |
| Expiry date | Sep 24, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/549
Abstract
A PIN type infrared photodiode including a first electrode, a n-type semiconductor, an atomic layer deposition coating of lead sulfide, a p-type semiconductor and a second electrode, wherein the n-type semiconductor comprises nanowires conformally coated with the atomic layer deposition coating of lead sulfide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.