Process for plasmonic-based high resolution color printing
US10831097B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 14, 2015 |
| Grant date | Nov 10, 2020 |
| Priority date | — |
| Expiry date | Oct 9, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/1226
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A process for plasmonic-based high resolution color printing is provided. The process includes a) providing a nanostructured substrate surface having a reverse structure geometry comprised of nanopits and nanoposts on a support, and b) forming a conformal continuous metal coating over the nanostructured substrate surface to generate a continuous metal film, the continuous metal film defining nanostructures for the plasmonic-based high resolution color printing, wherein a periodicity of the nanostructures is equal to or less than a diffraction limit of visible light. A nanostructured metal film or metal-film coated support obtained by the process and a method for generating a color image are also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.