Reticle management method and semiconductor device fabrication method including the same
US10831115B1 · kind B1 · utility
10Cited by
7References
19Claims
0Family size
Assignee
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Key dates
| Filing date | Jan 28, 2020 |
| Grant date | Nov 10, 2020 |
| Priority date | — |
| Expiry date | Jan 28, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67359
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed are reticle management methods and semiconductor device fabrication methods. The reticle management method includes inspecting a reticle using a first inspection method, inspecting a reticle pod storing the reticle using a second inspection method different from the first inspection method, and cleaning the reticle pod when a particle is present on the reticle pod.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.