Photocrosslinked polymers for enhanced durability
US10835638B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 16, 2018 |
| Grant date | Nov 17, 2020 |
| Priority date | — |
| Expiry date | Nov 9, 2038 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08J2375/04
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A block copolymer including a plurality of polymeric chains and a plurality of cross-linking compound residues linking together the plurality of polymeric chains. The plurality of polymeric chains forms a plurality of hard domains and a plurality of soft domains. Each polymeric chain includes a plurality of soft segments and a plurality of hard segments. The plurality of soft segments includes a polyisobutylene diol or diamine residue. The plurality of soft segments forms the plurality of soft domains. The plurality of hard segments including a diisocyanate residue. The plurality of hard segments forms the plurality of hard domains. The cross-linking compound residues link together the hard segments of the plurality of polymeric chains.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.