Patent · US Active

Photocrosslinked polymers for enhanced durability

US10835638B2 · kind B2 · utility

0Cited by
161References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 16, 2018
Grant dateNov 17, 2020
Priority date
Expiry dateNov 9, 2038

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08J2375/04
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

A block copolymer including a plurality of polymeric chains and a plurality of cross-linking compound residues linking together the plurality of polymeric chains. The plurality of polymeric chains forms a plurality of hard domains and a plurality of soft domains. Each polymeric chain includes a plurality of soft segments and a plurality of hard segments. The plurality of soft segments includes a polyisobutylene diol or diamine residue. The plurality of soft segments forms the plurality of soft domains. The plurality of hard segments including a diisocyanate residue. The plurality of hard segments forms the plurality of hard domains. The cross-linking compound residues link together the hard segments of the plurality of polymeric chains.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.