Patent · US Active

Polyamide molding compound having high gloss and high notch impact resistance

US10836905B2 · kind B2 · utility

8Cited by
22References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 28, 2018
Grant dateNov 17, 2020
Priority date
Expiry dateAug 28, 2038

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB29K2077/00
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

The present invention relates to polyamide molding compounds that are characterized by high notch impact resistance and high gloss. These polyamide molding compounds comprise the following components or consist of these components: (A) 84.5 to 97.0 wt % of at least one amorphous or microcrystalline copolyamide selected from the group comprising PA 6I/6T/MACMI/MACMT/PACMI/PACMT/Y, PA 6I/6T/MACMI/MACMT/Y, and mixtures thereof; (B) 3.0 to 9.5 wt % of at least one specific functionalized impact resistance modifier; and (C) 0 to 6 wt % of at least one additive; wherein the weight proportions of the components (A) to (C) add up to 100 wt %. The present invention furthermore relates to molded bodies composed of this polyamide molding compound.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.